電沉積Cr-C,Ni-P非晶結構穩定性對C,P含量的依賴性

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電沉積Cr-C,Ni-P非晶結構穩定性對C,P含量的依賴性

于維平, 段淑貞

文章導航 > 工程科學學報 > 1996 > 18(S2): 64-68

于維平, 段淑貞. 電沉積Cr-C,Ni-P非晶結構穩定性對C,P含量的依賴性[J]. 工程科學學報, 1996, 18(S2): 64-68. doi: 10.13374/j.issn1001-053x.1996.s2.014

引用本文:

于維平, 段淑貞. 電沉積Cr-C,Ni-P非晶結構穩定性對C,P含量的依賴性[J]. 工程科學學報, 1996, 18(S2): 64-68. doi: 10.13374/j.issn1001-053x.1996.s2.014

Yu Weiping, Duan Shuzhen. Dependence of Structure Stability of Electrodepositing Amorphous Cr-C and Ni-P on C,P Contents[J]. Chinese Journal of Engineering, 1996, 18(S2): 64-68. doi: 10.13374/j.issn1001-053x.1996.s2.014

Citation:

Yu Weiping, Duan Shuzhen. Dependence of Structure Stability of Electrodepositing Amorphous Cr-C and Ni-P on C,P Contents[J]. Chinese Journal of Engineering, 1996, 18(S2): 64-68. doi: 10.13374/j.issn1001-053x.1996.s2.014

于維平, 段淑貞. 電沉積Cr-C,Ni-P非晶結構穩定性對C,P含量的依賴性[J]. 工程科學學報, 1996, 18(S2): 64-68. doi: 10.13374/j.issn1001-053x.1996.s2.014

引用本文:

于維平, 段淑貞. 電沉積Cr-C,Ni-P非晶結構穩定性對C,P含量的依賴性[J]. 工程科學學報, 1996, 18(S2): 64-68. doi: 10.13374/j.issn1001-053x.1996.s2.014

Yu Weiping, Duan Shuzhen. Dependence of Structure Stability of Electrodepositing Amorphous Cr-C and Ni-P on C,P Contents[J]. Chinese Journal of Engineering, 1996, 18(S2): 64-68. doi: 10.13374/j.issn1001-053x.1996.s2.014

Citation:

Yu Weiping, Duan Shuzhen. Dependence of Structure Stability of Electrodepositing Amorphous Cr-C and Ni-P on C,P Contents[J]. Chinese Journal of Engineering, 1996, 18(S2): 64-68. doi: 10.13374/j.issn1001-053x.1996.s2.014

電沉積Cr-C,Ni-P非晶結構穩定性對C,P含量的依賴性

doi: 10.13374/j.issn1001-053x.1996.s2.014

于維平¹,
段淑貞²

1. 北京航空航天大學, 北京 100083;
2. 北京科技大學理化系

基金項目:

國家自然科學基金及冶金部腐蝕-磨蝕與表面技術開放研究實驗室資助

作者簡介:
于維平女 43歲副教授博士

中圖分類號: TG146.15
計量
- 文章訪問數: 286
- HTML全文瀏覽量: 92
- PDF下載量: 7
- 被引次數: 0
出版歷程
- 收稿日期: 1996-01-22
- 網絡出版日期: 2021-11-13

Dependence of Structure Stability of Electrodepositing Amorphous Cr-C and Ni-P on C,P Contents

Yu Weiping¹,
Duan Shuzhen²

1. Beijing University of Aeronautics and Astronautics, Beijing 100083, PRC;
2. University of Science and Technology Beijing

摘要: 研究了在高加速電壓的電子束作用下,Cr-C、Ni-P非晶鍍層結構的穩定性與其組分的關系,發現在遠低于晶化溫度的條件下,類金屬元素含量越低,晶化程度越大。
- Cr-C /
- Ni-P /
- 非晶鍍層 /
- 結構穩定性
Abstract: The dependence of structure stability of electrodepositing amorphous Cr-C and Ni-P films on their components have been researched by action of high accelerated voltage electronic cluster. It was shown that, when temperature was far lower than crystalline temperature, the lower the content of submetallic element in films,the bigger the extent to crystallize.
- Cr-C /
- Ni-P /
- amorphous film /
- structure stability

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文章訪問數: 286
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PDF下載量: 7
被引次數: 0

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