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  • 李華瑞, 董克柱, 陳立虹, 尹秀蘭, 閻連洞, 林宏平. 非晶合金薄膜(Fe0.4Ni0.2Cr0.4)72Si28的電阻特性與溫度及非晶度的關系[J]. 工程科學學報, 1984, 6(3): 77-83. DOI: 10.13374/j.issn1001-053x.1984.03.008
    引用本文: 李華瑞, 董克柱, 陳立虹, 尹秀蘭, 閻連洞, 林宏平. 非晶合金薄膜(Fe0.4Ni0.2Cr0.4)72Si28的電阻特性與溫度及非晶度的關系[J]. 工程科學學報, 1984, 6(3): 77-83. DOI: 10.13374/j.issn1001-053x.1984.03.008
    Li Huarui, Dong Kezhu, Chen Lihong, Yin Xiulan, Yan Liandong, Lin Hongping. The Relationship of Resistance Properties Amorphous Alloy Film (Fe0.4Ni0.2Cr0.4)72Si28 with Temperature and Non-Crystallinity[J]. Chinese Journal of Engineering, 1984, 6(3): 77-83. DOI: 10.13374/j.issn1001-053x.1984.03.008
    Citation: Li Huarui, Dong Kezhu, Chen Lihong, Yin Xiulan, Yan Liandong, Lin Hongping. The Relationship of Resistance Properties Amorphous Alloy Film (Fe0.4Ni0.2Cr0.4)72Si28 with Temperature and Non-Crystallinity[J]. Chinese Journal of Engineering, 1984, 6(3): 77-83. DOI: 10.13374/j.issn1001-053x.1984.03.008

    非晶合金薄膜(Fe0.4Ni0.2Cr0.4)72Si28的電阻特性與溫度及非晶度的關系

    The Relationship of Resistance Properties Amorphous Alloy Film (Fe0.4Ni0.2Cr0.4)72Si28 with Temperature and Non-Crystallinity

    • 摘要: 測定了非晶合金薄膜(Fe0.4Ni0.2Cr0.4)72Si28在20-620℃范圍內電阻隨溫度變化的曲線,以及這一變化與薄膜的物相構成及非晶度的關系。研究了這一合金薄膜電阻溫度系數TCR隨熱處理溫度的變化以及它與非晶度的關系。探討了合金薄膜中Si的含量對TCR數值的影響及作用機理。指出了獲得合金薄膜最佳電阻溫度系數的一些可能的途徑。

       

      Abstract: The change of resistance of amorphous alloy film(Fe0.4Ni0.2Cr0.4)72Si28 with temperature ranging from 20 to 620℃ and the relationship of this change with phase composition and non-crystallinity of this film were determined. The temperature coefficient of resistance with tempering temperature and its relationship with non-crystallinity was studied. The influence and principles of Si content in this film to TCR value was disscused. The change of resistance of amorphous alloy film(Fe0.4Ni0.2Cr0.4)72Si28 with temperature ranging from 20 to 620℃ and the relationship of this change with phase composition and non-crystallinity of this film were determined. The temperature coefficient of resistance with tempering temperature and its relationship with non-crystallinity was studied. The influence and principles of Si content in this film to TCR value was disscused.

       

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