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  • 王曾雋, 馬肇曾, 葛葆云, 文耀典. 低溫化學氣相沉積氮化鈦[J]. 工程科學學報, 1983, 5(1): 176-181. DOI: 10.13374/j.issn1001-053x.1983.01.015
    引用本文: 王曾雋, 馬肇曾, 葛葆云, 文耀典. 低溫化學氣相沉積氮化鈦[J]. 工程科學學報, 1983, 5(1): 176-181. DOI: 10.13374/j.issn1001-053x.1983.01.015
    Wang Cengjuan, Ma Zhaoceng, Ge Baoyun, Wen Yaodian. Chemical Vapour Deposition of Titanium Nitride at Lower Temperatures[J]. Chinese Journal of Engineering, 1983, 5(1): 176-181. DOI: 10.13374/j.issn1001-053x.1983.01.015
    Citation: Wang Cengjuan, Ma Zhaoceng, Ge Baoyun, Wen Yaodian. Chemical Vapour Deposition of Titanium Nitride at Lower Temperatures[J]. Chinese Journal of Engineering, 1983, 5(1): 176-181. DOI: 10.13374/j.issn1001-053x.1983.01.015

    低溫化學氣相沉積氮化鈦

    Chemical Vapour Deposition of Titanium Nitride at Lower Temperatures

    • 摘要: 用純氨做原料在鋼鐵表面進行化學氣相沉積氮化鈦時,可使沉積溫度降到570℃以下。高速鋼刀具經沉積后不需再行淬火處理。本文介紹了沉積反應時純氨的制備以及為降低沉積溫度的沉積條件選擇等。樣品經此處理后,涂層生長速率為2.7μ2.5(μm)/hr,涂展硬度HV0,05,約為1700kg/mm2。X射線衍射分析證明表面為TiN。

       

      Abstract: The deposition temperature can be hold below 570℃ by using pure ammonia durnig CVD of TiN on the surface of iron and steel parts. After deposition quenching is not necessery for the tools nmade of high speed steel. The preparation of pure ammonia used for deposition and the optinum condition for deposition at lower temperature were investigaled. The deposition rate is 2.5/μm/hr, the hardness of the layer of deposition is about 1700kg/mm2, X-Rays diffraction indicates that the product of deposition on the surface is TiN.

       

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