由氨解法制備的Si<sub>3</sub>N<sub>4</sub>粉末的表面元素狀態

由氨解法制備的Si₃N₄粉末的表面元素狀態

摘要: 用XPS表面分析,研究了由氨解法在不同溫度下熱解所得的Si₃N₄粉末,并與由硅粉氮化所得的商用Si₃N₄粉末作了比較。由氨解法制備的Si₃N₄粉末其表面存在兩種狀態的氧:結合狀態的氧和吸附態的氧,其表面組成為Si_2.2-2.7N_2.9-3.7O。由硅粉氮化所制得Si₃N₄其表面也存在兩種狀態的氧,其表面組成則為Si_0.8N_0.8O。

Abstract: Si₃N₄ powders made from imide process and thermal decomposed at different temperatures have investigated by XPS surface analysis; They were compared with a commercial Si₃N₄ powder made with nitridation process. Oxygen both in combined form of Si_2.2-2.7N_2.9-3.7O layer and absorbed form were found on the powder surface, in contrast to Si_0.8 N_0.8O layer and absorbed form in the case of Si₃N₄ powders made from Si aitridation.